Strip-loaded waveguides on thin-film lithium niobate realized via multi-photon lithography

verfasst von: Alexandra Rittmeier, Philipp Gehrke, Muhamed A. Sewidan, Elisavet Chatzizyrli, Angeliki Afentaki, Gerd A. Hoffmann, Jörg Neumann, Andreas Wienke, Dietmar Kracht, Michael Kues, Moritz Hinkelmann
Abstract: Integrated photonics play a pivotal role in the advancement of photonic systems in the future. The key to this lies in the research and development of novel materials and fabrication techniques. Lithium niobate (LN) is a material of particular interest due to its advantageous second-order nonlinearity and electro-optical properties. Conventionally, LN waveguides have been fabricated through multi-step processes involving lithographic patterning and dry etching techniques, which are time-consuming and laborious. In this study, we demonstrate an etchless production approach for strip-loaded thin-film LN waveguides through multi-photon lithography. The propagation losses of the fabricated waveguides are as low as 0.15 dB/cm at a wavelength of 1550 nm, which is comparable to existing etching techniques. The manufacturing approach enables a significantly reduced production time and reuse of the thin-film LN substrate. Specifically, we demonstrate the capability of erasing and reprinting polymer strips, fostering a more sustainable practice in the development of LN-based photonic integrated circuits (PICs). The approach can be transferred to other thin-film platforms and enables easier access to waveguide development, which can propel material research in the context of PIC development.
Organisationseinheit(en): PhoenixD: Simulation, Fabrikation und Anwendung optischer Systeme
Institut für Photonik
Externe Organisation(en): Laser Zentrum Hannover e.V. (LZH)
Typ: Artikel
Journal: Optics express
Band: 33
Seiten: 45856-45868
Anzahl der Seiten: 13
ISSN: 1094-4087
Publikationsdatum: 21.10.2025
Publikationsstatus: Veröffentlicht
Peer-reviewed: Ja
ASJC Scopus Sachgebiete: Atom- und Molekularphysik sowie Optik
Elektronische Version(en): https://doi.org/10.1364/OE.571365 (Zugang: Offen)
: Details im Forschungsportal „Research@Leibniz University“

BibTeX

@article{2653f4d222cb42d6aaabd81c980129c1,
title = "Strip-loaded waveguides on thin-film lithium niobate realized via multi-photon lithography",
abstract = "Integrated photonics play a pivotal role in the advancement of photonic systems in the future. The key to this lies in the research and development of novel materials and fabrication techniques. Lithium niobate (LN) is a material of particular interest due to its advantageous second-order nonlinearity and electro-optical properties. Conventionally, LN waveguides have been fabricated through multi-step processes involving lithographic patterning and dry etching techniques, which are time-consuming and laborious. In this study, we demonstrate an etchless production approach for strip-loaded thin-film LN waveguides through multi-photon lithography. The propagation losses of the fabricated waveguides are as low as 0.15 dB/cm at a wavelength of 1550 nm, which is comparable to existing etching techniques. The manufacturing approach enables a significantly reduced production time and reuse of the thin-film LN substrate. Specifically, we demonstrate the capability of erasing and reprinting polymer strips, fostering a more sustainable practice in the development of LN-based photonic integrated circuits (PICs). The approach can be transferred to other thin-film platforms and enables easier access to waveguide development, which can propel material research in the context of PIC development.",
author = "Alexandra Rittmeier and Philipp Gehrke and Sewidan, {Muhamed A.} and Elisavet Chatzizyrli and Angeliki Afentaki and Hoffmann, {Gerd A.} and J{\"o}rg Neumann and Andreas Wienke and Dietmar Kracht and Michael Kues and Moritz Hinkelmann",
note = "Publisher Copyright: {\textcopyright} 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.",
year = "2025",
month = oct,
day = "21",
doi = "10.1364/OE.571365",
language = "English",
volume = "33",
pages = "45856--45868",
journal = "Optics express",
issn = "1094-4087",
publisher = "OSA - The Optical Society",
number = "22",
}

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